Effect of Metallic Nanoparticles and Ions on Seeds Germinating Under Cadmium Stress.

Autor: Landa, Premysl, Petrova, Sarka, Dytrych, Pavel, Kupcik, Jaroslav, Motkova, Katerina, Soudek, Petr
Předmět:
Zdroj: Journal of Plant Growth Regulation; Dec2023, Vol. 42 Issue 12, p7749-7758, 10p
Abstrakt: Cadmium contamination of soil and water as a result of industrialization and inappropriate agricultural practices is a global problem. As Cd is a toxic and carcinogenic element, its uptake into crops and transfer to the food chain poses serious health risks. Nanoparticles (NPs) are considered as promising materials for agriculture, which can be used as fertilizers, growth promoters, or to reduce negative environmental impacts. Therefore, the effect of Ag, Fe3O4, MnO2, TiO2, and ZnO NPs on the root elongation and Cd accumulation in germinating white mustard under cadmium stress was investigated in this study. The efficiency of NPs was compared with the effect of Ag+, Fe2+, Mn2+, and Zn2+ ions. Amelioration of Cd stress (Cd reduced root length to 46.9% of the control) was provided by ZnO NPs (root length restored to 76.5% of the control) and Zn2+ ions (56.7% of the control) at pH 8, while at pH 6 mainly ionic Zn2+ was toxic. Ag NPs (root length 107.7 and 129.6% of the control at pH 8 and pH 6, respectively) and Ag+ ions (157.5% and 137.6% of the control at pH 8 and pH 6, respectively) increased root elongation of seedlings unexposed to Cd and to some extent (insignificantly) under Cd stress as well. The reduction of Cd uptake into the seedlings in the presence of ZnO NPs and Zn2+ ions from 28.30 to 19.57 and to 23.04 µg/g DW at pH 8, respectively, and from 33.29 to 28.30 and to 25.90 µg/g DW at pH 6, respectively, was probably responsible for the protective effect of these substances. Other materials tested did not significantly affect the root growth under Cd stress, nor did they reduce Cd accumulation in the seedlings as well. The role of the chemical species was more decisive than the role of its form. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index