3D resist master evaluation protocol for nanoimprint lithography.
Autor: | Fernandez Rodas, Diana, Rêche, Jérôme, Tiron, Raluca |
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Zdroj: | Proceedings of SPIE; 9/13/2023, Vol. 12653, p126530F-126530F-8, 1p |
Databáze: | Complementary Index |
Externí odkaz: |