EUV mask defect inspection for the 3nm technology node.
| Autor: | Hermans, Yannick, Heil, Tilmann, Capelli, Renzo, Szafranek, Bartholomaeus, Rhinow, Daniel, Mette, Gerson, Salg, Patrick, Hermanns, Christian Felix, Dey, Bappaditya, Halipre, Luc, Trivkovic, Darko, Rincon Delgadillo, Paulina, Marschner, Thomas, Halder, Sandip |
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| Zdroj: | Proceedings of SPIE; 2/9/2024, Vol. 12802, p128020H-128020H-10, 1p |
| Databáze: | Complementary Index |
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