Plasma-enhanced chemical vapor deposition of GaxS1−x thin films: structural and optical properties.

Autor:	Mochalov, Leonid, Kudryashov, Mikhail, Vshivtsev, Maksim, Prokhorov, Igor, Kudryashova, Yuliya, Mosyagin, Pavel, Slapovskaya, Ekaterina
Předmět:	PLASMA-enhanced chemical vapor deposition THIN film deposition OPTICAL films CHLORINE NONEQUILIBRIUM plasmas OPTICAL properties SILICON nitride films THIN films
Zdroj:	Optical & Quantum Electronics; Oct2023, Vol. 55 Issue 10, p1-10, 10p
Abstrakt:	Gallium sulfides are wide-gap materials (band gap in the range of 2.85–3.05 eV) that have great potential for applications in optoelectronics, photovoltaics, nonlinear optics, and energy storage. In this study, thin films of gallium sulfide GaxS1−x were prepared for the first time by plasma-enhanced chemical vapor deposition using a transport reaction involving chlorine. High-purity elemental gallium and sulfur were directly used as starting materials. The non-equilibrium low-temperature plasma of the RF discharge (40.68 MHz) initiated chemical transformations. The effect of plasma power on the composition, structure, surface morphology, and optical properties of the films was studied. GaxS1−x films have sufficiently high transparency in the visible and near-IR ranges (up to 70%). [ABSTRACT FROM AUTHOR]
Databáze:	Complementary Index
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