Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film.

Autor: Abi Younes, Petros, Yadav, Ashok-Kumar, Zhukush, Medet, Le, Van-Hoan, Roussel, Hervé, Richard, Marie-Ingrid, Camp, Clément, Szeto, Kai, Ciatto, Gianluca, Schneider, Nathanaelle, Quadrelli, Elsje Alessandra, Renevier, Hubert, Gauthier, Nicolas
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Zdroj: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Jul2023, Vol. 41 Issue 4, p1-13, 13p
Abstrakt: Amorphous organic-inorganic hybrid thin films (Ti-thiolate) deposited on thermal SiO 2 substrate by atomic layer deposition/molecular layer deposition are converted into textured titanium disulfide (TiS 2) ultrathin films, of thickness down to 5.5 nm, upon annealing under Ar/H 2 (5%) atmosphere at mild temperature (300 ° C). Two annealing strategies were investigated by in situ synchrotron x-ray fluorescence, allowing us to master the mineralization of the amorphous Ti-thiolate into titanium disulfide. Stoichiometry and crystallinity of the thin films were characterized by x-ray photoelectron spectroscopies, Raman scattering, and x-ray absorption at the S K-edge. Lamellar structure parallel to the substrate surface was observed by transmission electron microscopy. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index