Evaluation of TiN hardmask films to prevent line wiggling due to plasma-induced film stress.
| Autor: | Turnquist, A., Kofuji, N., Sebastian, J., Liu, Z., Kou, H., Fukuda, H., Tomczak, Y., Sun, Y., Piumi, D., Roest, D. D. |
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| Zdroj: | Proceedings of SPIE; 4/12/2023, Vol. 12499, p1249904-1249904, 1p |
| Databáze: | Complementary Index |
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