Fluoroalkylated tin-oxo nano clusters as resist candidates for extreme UV lithography.
| Autor: | Ku, Yejin, Ahn, Hyungju, Lee, Jin-Kyun, Kim, Jiho, Park, Byeong-Gyu, Lee, Sangsul, Jang, Yu Ha, Jung, Byung Jun, Koh, Chawon, Nishi, Tsunehiro, Kim, Hyun-Woo |
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| Zdroj: | Proceedings of SPIE; 4/11/2023, Vol. 12498, p1249816-1249816, 1p |
| Databáze: | Complementary Index |
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