New functional surface treatment process and primers for high-NA EUV lithography.
| Autor: | Shibayama, Wataru, Shigaki, Shuhei, Takeda, Satoshi, Kato, Kodai, Nakajima, Makoto, Sakamoto, Rikimaru |
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| Zdroj: | Proceedings of SPIE; 4/11/2023, Vol. 12498, p124980O-124980O-10, 1p |
| Databáze: | Complementary Index |
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