Towards molecular-scale kinetic Monte Carlo simulation of pattern formation in photoresist materials for EUV nanolithography.
| Autor: | Fernández Míguez, Lois, Bobbert, Peter A., Coehoorn, Reinder |
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| Zdroj: | Proceedings of SPIE; 4/11/2023, Vol. 12498, p124980E-124980E-9, 1p |
| Databáze: | Complementary Index |
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