Mask errors impact on grayscale lithography patterning.
| Autor: | Palanchoke, Ujwol, Bélot, Gaby, Bérard-Bergery, Sébastien, Saugnier, Juline, Sungauer, Elodie, Beylier, Charlotte, Tomaso, Florian, Pourteau, Marie-Line, Mendes, Ivanie, Coquand, Rémi, Bernadac, Arthur |
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| Zdroj: | Proceedings of SPIE; 4/10/2023, Vol. 12497, p124970N-124970N-17, 1p |
| Databáze: | Complementary Index |
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