Patterning assessment using 0.33NA EUV single mask for next generation DRAM manufacturing.
| Autor: | Lee, Jeonghoon, Halder, Sandip, Pham, Van Tuong, Fallica, Roberto, Heo, Seonggil, Sah, Kaushik, Suh, Hyo Seon, Blanco, Victor, Gillijns, Werner, Cross, Andrew, Maguire, Ethan, Armeanu, Ana-Maria, Liubich, Vladislav, Malankin, Evgeny, Zhang, Xima, Sears, Monica Kempsell, Lafferty, Neal, Fenger, Germain, Wei, Chih-I, Kim, Ryoung Han |
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| Zdroj: | Proceedings of SPIE; 4/8/2023, Vol. 12495, p124950S-124950S-11, 1p |
| Databáze: | Complementary Index |
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