Computational lithography solutions to support EUV high-NA patterning.
| Autor: | Zhao, Rongkuo, Zhou, Fan, Tang, Jialei, Lu, Jeff, Liu, Yunbo, Sun, Dezheng, Tien, Ming-Chun, Hsu, Stephen, Gupta, Rachit, Zhang, Youping, Zimmermann, Joerg |
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| Zdroj: | Proceedings of SPIE; 4/8/2023, Vol. 12495, p124950R-124950R-12, 1p |
| Databáze: | Complementary Index |
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