High accuracy OPC modeling for new EUV low-K1 mask technology options.
| Autor: | Sakr, Enas, DeLancey, Rob, Hoppe, Wolfgang, Levinson, Zac, Iwanow, Robert, Chen, Ryan, Yang, Delian, Lucas, Kevin |
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| Zdroj: | Proceedings of SPIE; 4/8/2023, Vol. 12495, p124950P-124950P-11, 1p |
| Databáze: | Complementary Index |
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