Effects of pulse parameters on electrochemical polishing of TC4 titanium alloy.

Autor: ZHENG Xipeng, LI Junfei, LAN Fulin, WANG Mengmeng, LIN Yiming
Předmět:
Zdroj: Electroplating & Finishing; 2023, Vol. 42 Issue 7, p55-62, 8p
Abstrakt: TC4 titanium alloy was electrochemically polished by using a pulse power supply. The effects of voltage, pulse frequency, and duty cycle on the polishing effectiveness were studied. The results showed that both surface roughness and material removal rate of TC4 titanium alloy were decreased initially and then increased with the increasing of pulse frequency. With the increasing of voltage or duty cycle, the surface roughness of TC4 titanium alloy was decreased initially and then increased, while the material removal rate was increased constantly. After being electrochemically polished at temperature 20 °C, interelectrode space 4 cm, voltage 25 V, pulse frequency 1 000 Hz, and duty cycle 40% for 6 min, the TC4 titanium alloy featured a smooth and uniform surface with a roughness (Ra) being reduced from initial 6.21 μm to 0.84 μm, and its material removal rate was 23.85 μm/min. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index