850 nm FDML: performance and challenges.

Autor: Klufts, M., Lotz, S., Bashir, M. A., Pfeiffer, T., Mlynek, A., Wieser, W., Chamorovskiy, A., Shidlovski, V., Huber, R.
Zdroj: Proceedings of SPIE; 12/1/2022, Vol. 12367, p1236705-1236705, 1p
Databáze: Complementary Index