Source/Drain Activation for Flexible Poly-Si Nanoscale pFETs with a Laser-Buffer Layer by CO2 laser Annealing.

Autor: Po-Cheng Hou, Wen-Hsien Huang, Ming-Hsuan Kao, Hsing-Hsiang Wang, Jia-Min Shieh, Chang-Hong Shen, Fu-Ming Pan, Li Chang
Zdroj: ECS Journal of Solid State Science & Technology; Jun2022, Vol. 11 Issue 6, p330-335, 6p
Databáze: Complementary Index