SF6 decomposition and layer formation due to excimer laser photoablation of SiO2 surface at gas–solid system.

Autor:	Sajad, Batool, Parvin, Parviz, Bassam, Mohamad Amin
Předmět:	INDUSTRIAL lasers EXCIMER lasers GAS lasers MATERIALS
Zdroj:	Journal of Physics D: Applied Physics; Dec2004, Vol. 37 Issue 24, p3402-3408, 7p
Abstrakt:	In this work, the effect of an excimer laser has been studied for presenting a method for SF6 decomposition and simultaneous formation of a SiF2 layer on amorphous SiO2. Though the excimer laser did not establish a gas phase photodissociation, we have shown that UV photoablation leads strongly to molecular decomposition in the SF6–SiO2 system. Moreover, the dependence of the decomposition process on the exposure parameters such as the wavelength and intensity as well as the gas pressure and the focal point distance from the gas–solid interface has been investigated. [ABSTRACT FROM AUTHOR]
Databáze:	Complementary Index
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