Thickness Optimization Simulation to Minimize Effective Reflectance in Broadband for SiO2/TiO2 Anti-Reflection Coating on Silicon Solar Cells.

Autor: JONG-CHOL KIM, YUN RI, UN-SONG PAK, KYONG-CHOL KIM, HYOK-CHANG KWON
Předmět:
Zdroj: Acta Physica Polonica: A; Jun2022, Vol. 141 Issue 6, p557-560, 4p
Abstrakt: By the finite-difference time-domain method, we modeled the reflection coefficient with the ratios of the layer thicknesses of SiO2/TiO2. SiO2/TiO2 thin film thickness ratios that minimize the effective reflectance in the broadband of 400-800 nm were simulated using an artificial neural network. For the Si/SiO2/TiO2 system, the results were obtained with the following layer parameters: n(Si)= 3:7-5.6, n(TiO2) = 2:3-2.7, d(TiO2) = 25 nm, and n(SiO2) = 1:5, d(SiO2) = 24 nm. The average effective reflectance coefficient in the broadband of 400-800 nm was about 6.6%. Accordingly, the optimization of the thickness parameters of the anti-reflection film has shown that it is possible to significantly reduce the total effective reflectance in the visible range, thereby increasing the efficiency of the solar cells. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index