Outlook for high-NA EUV patterning: a holistic patterning approach to address upcoming challenges.
| Autor: | Raley, Angélique, Huli, Lior, Grzeskowiak, Steven, Lutker-Lee, Katie, Krawicz, Alexandra, Feurprier, Yannick, Liu, Eric, Kato, Kanzo, Nafus, Kathleen, Dauendorffer, Arnaud, Bae, Nayoung, LaRose, Josh, Metz, Andrew, Hetzer, Dave, Honda, Masanobu, Nishizuka, Tetsuya, Ko, Akiteru, Okada, Soichiro, Ido, Yasuyuki, Onitsuka, Tomoya |
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| Zdroj: | Proceedings of SPIE; 1/23/2022, Vol. 12056, p120560A-120560A-13, 1p |
| Databáze: | Complementary Index |
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