| Autor: |
Skriabin, A. S., Chesnokov, D. A., Novikov, P. A., Zhupanov, V. G., Gizha, S. S., Shlyahtyn, O. S. |
| Předmět: |
|
| Zdroj: |
AIP Conference Proceedings; 2022, Vol. 2383/2470 Issue 1, p1-5, 5p |
| Abstrakt: |
Nowadays reflective and anti-reflective multilayer HfO2/SiO2 and ZrO2/SiO2 coatings with a thickness of 140...3700 nm are employed in radiation-resistant optical components of high-density energy installations such as lasers, plasma accelerators etc. The films on silica substrates were obtained with electron beam evaporation in oxygen medium. The multilayers and bilayers were characterized by XRR and IR and VIS spectroscopy. The coatings demonstrated a high stability of spectral reflectivity and transmissivity. In particular, reflectivity of ZrO2/SiO2 multilayer is ≈99.9% at the wavelength of 1054 nm. XRR allowed to estimate such parameters as a thickness and a density of the inner interface (Zr/Si or Hf/Si). For HfO2/SiO2 multilayers, typically, the interface thickness was ≈2.3 nm. The density was 5.7 g/cm3. The studied films could be applied in optical elements for such setups as the high-current plasma accelerators. This type of accelerators generating a high intensity broadband VUV-ViS-IR radiation are under consideration as prospective systems for lithography, bio applications etc. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
|
