The interface formation of copper and low dielectric constant fluoro-polymer: Plasma surface...
| Autor: | Du, M., Opila, R. L. |
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| Zdroj: | Journal of Applied Physics; 2/1/1999, Vol. 85 Issue 3, p1496, 7p, 1 Black and White Photograph, 1 Chart, 7 Graphs |
| Abstrakt: | Studies the bulk and surface diffusion of copper deposited on a treated low dielectric constant fluoropolymer using x-ray photoelectron spectroscopy. Experimental details; Results and discussion; Conclusions. |
| Databáze: | Complementary Index |
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