3D-MC modelling of particle contamination induced defects in ebeam mask writing.
Autor: | Klikovits, Jan, Polster, Robert, Hofmann, Ulrich, Feicke, Axel, Wandel, Timo |
---|---|
Zdroj: | Proceedings of SPIE; 7/6/2021, Vol. 11855, p1185503-1185503, 1p |
Databáze: | Complementary Index |
Externí odkaz: |