3D-MC modelling of particle contamination induced defects in ebeam mask writing.

Autor: Klikovits, Jan, Polster, Robert, Hofmann, Ulrich, Feicke, Axel, Wandel, Timo
Zdroj: Proceedings of SPIE; 7/6/2021, Vol. 11855, p1185503-1185503, 1p
Databáze: Complementary Index