| Autor: |
Shin, S. J., Bayu Aji, L. B., Bae, J. H., Engwall, A. M., Nielsen, M. H., Hammons, J. A., Zuo, X. B., Lee, B., Lepro, X., Mirkarimi, P. B., Kucheyev, S. O. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 9/28/2021, Vol. 130 Issue 12, p1-12, 12p |
| Abstrakt: |
Many applications of boron carbide ( B 4 C) films entail deposition on non-planar substrates, necessitating a better understanding of oblique angle deposition phenomena. Here, we systematically study the effect of substrate tilt on properties of B 4 C films with thicknesses up to 10 μ m deposited by direct current magnetron sputtering. Results show that all films are amorphous and columnar with an average column width of ∼ 100 nm, independent of substrate tilt. Column tilt angles are limited to ∼ 20 ° even for substrate tilt of 80 °. Film density, residual stress, and the refractive index weakly (within ≲ 20 %) depend on substrate tilt. Oxygen impurities bond preferentially with carbon atoms in inter-columnar regions. Substrate tilt has a major effect on mechanical properties that decrease by ∼ 50 % , suggesting weak interconnection between nano-columns. Implications of these observations for the deposition onto non-planar substrates are discussed. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
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