| Autor: |
He, Yuan-Hao, Mao, Wei, Du, Ming, Peng, Zi-Ling, Wang, Hai-Yong, Zheng, Xue-Feng, Wang, Chong, Zhang, Jin-Cheng, Hao, Yue |
| Předmět: |
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| Zdroj: |
Chinese Physics B; May2021, Vol. 30 Issue 5, p1-7, 7p |
| Abstrakt: |
A novel vertical InN/InGaN heterojunction tunnel FET with hetero T-shaped gate as well as polarization-doped source and drain region (InN-Hetero-TG-TFET) is proposed and investigated by Silvaco-Atlas simulations for the first time. Compared with the conventional physical doping TFET devices, the proposed device can realize the P-type source and N-type drain region by means of the polarization effect near the top InN/InGaN and bottom InGaN/InN heterojunctions respectively, which could provide an effective solution of random dopant fluctuation (RDF) and the related problems about the high thermal budget and expensive annealing techniques due to ion-implantation physical doping. Besides, due to the hetero T-shaped gate, the improvement of the on-state performance can be achieved in the proposed device. The simulations of the device proposed here in this work show ION of 4.45 × 10−5 A/μm, ION/IOFF ratio of 1013, and SSavg of 7.5 mV/dec in InN-Hetero-TG-TFET, which are better than the counterparts of the device with a homo T-shaped gate (InN-Homo-TG-TFET) and our reported lateral polarization-induced InN-based TFET (PI-InN-TFET). These results can provide useful reference for further developing the TFETs without physical doping process in low power electronics applications. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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