Optimum technological modes of ion implantation and subsequent annealing for formation of thin nanosized silicide films.
| Autor: | Bazarov, D., Bekpulatov, Ilkhom, Turapov, Ilkhom, Abraeva, Sevara, Normuminov, Jakhongir |
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| Zdroj: | E3S Web of Conferences; 2021, Vol. 264, p1-7, 7p |
| Databáze: | Complementary Index |
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