Nanoscale Observation of Dielectric Damage to Low k MSQ Interconnects from Reactive Ion Etching and Ash Treatment.
| Autor: | Gross, Todd S., Yao, Shaoning |
|---|---|
| Zdroj: | MRS Online Proceedings Library; 2005, Vol. 863 Issue 1, p1-5, 5p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|
Full text from SpringerLink