| Autor: |
Wilk, S. J., Goryll, M., Laws, G. M., Goodnick, S. M., Thornton, T. J., Saraniti, M., Tang, J., Eisenberg, R. S. |
| Předmět: |
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| Zdroj: |
Applied Physics Letters; 10/11/2004, Vol. 85 Issue 15, p3307-3309, 3p, 1 Diagram, 3 Graphs |
| Abstrakt: |
We present a method for microfabricating apertures in a silicon substrate using well-known cleanroom technologies resulting in highly reproducible giga-seal resistance bilayer formations. Using a plasma etcher, 150 μm apertures have been etched through a silicon wafer. Teflon™ has been chemically vapor deposited so that the surface resembles bulk Teflon and is hydrophobic. After fabrication, reproducible high resistance bilayers were formed and characteristic measurements of a self-inserted single OmpF porin ion channel protein were made. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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