Non-routine Dopant, Impurity and Stoichiometry Characterization of SiGe, SiON and Ultra-low Energy B-implanted Si Using Secondary Ion Mass Spectrometry.
Autor: | Magee, Charles W., Buyuklimanli, Temel H., Marino, John W., Novak, Steven W., Sahiner, M. Alper |
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Zdroj: | MRS Online Proceedings Library; 2002, Vol. 717 Issue 1, p1-10, 10p |
Databáze: | Complementary Index |
Externí odkaz: |