Effect of Fluorine on the Diffusion of Boron in Amorphous Silicon.
| Autor: | Jacques, J. M., Robertson, L. S., Jones, K. S., Bennett, Joe, Rendon, Mike |
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| Zdroj: | MRS Online Proceedings Library; 2002, Vol. 717 Issue 1, p1-6, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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