Modeling of Diffusion and Activation of Low Energy Arsenic Implants in Silicon.
| Autor: | Chakravarthi, Srinivasan, Chidambaram, P. R., Machala, Charles, Jain, Amitabh, Zhang, Xin |
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| Zdroj: | MRS Online Proceedings Library; 2002, Vol. 717 Issue 1, p1-6, 6p |
| Databáze: | Complementary Index |
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