Channel engineering and junction overlap issues for ultra-shallow junctions formed by SPER in the 45 nm CMOS technology node.
| Autor: | Severi, Simone, Henson, Kirklen, Lindsay, Richard, Lauwers, Anne, Pawlak, Bartek J., Surdeanu, Radu, De Meyer, K. |
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| Zdroj: | MRS Online Proceedings Library; 2004, Vol. 810 Issue 1, p43-48, 6p |
| Databáze: | Complementary Index |
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