Preparation of Large, Location-Controlled SI Grains by Excimer Laser Crystallization of α-SI FILM SPUTTERED AT 100°C.
| Autor: | He, Ming, Neihof, E. J. J., Van Andel, Y., Schellevis, H., Ishihara, R., Metselaar, J. W., Beenakker, C. I. M. |
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| Zdroj: | MRS Online Proceedings Library; 2006, Vol. 910 Issue 1, p1-6, 6p |
| Databáze: | Complementary Index |
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