Ellipsometry Measurement Accuracy of Gate Oxides under Polysilicon.
| Autor: | Jiang, Gary, Pelcher, Don, Kwon, Daewon, Clerico, Jana, Collins, George |
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| Zdroj: | MRS Online Proceedings Library; 2003, Vol. 782 Issue 1, p1-6, 6p |
| Databáze: | Complementary Index |
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