Influence of low thermal budget pre-anneals on the high temperature redistribution of low energy boron implants in silicon.
Autor: | Boucard, F., Schott, M., Mathiot, D., Rivallin, P., Holliger, P., Guichard, E. |
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Zdroj: | MRS Online Proceedings Library; 2001, Vol. 669 Issue 1, p1-6, 6p |
Databáze: | Complementary Index |
Externí odkaz: |