Influence of low thermal budget pre-anneals on the high temperature redistribution of low energy boron implants in silicon.

Autor: Boucard, F., Schott, M., Mathiot, D., Rivallin, P., Holliger, P., Guichard, E.
Zdroj: MRS Online Proceedings Library; 2001, Vol. 669 Issue 1, p1-6, 6p
Databáze: Complementary Index