Binary HfO2:SiO2 used as High-k Gate Oxide in Combinatorial Material Library Method.
| Autor: | Chao, Wen-Hsuan, Wang, Lih-Ping, Wang, Shu-Huei, Huang, T-H, Wu, R-J, Cheng, Hung-Chiao |
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| Zdroj: | MRS Online Proceedings Library; 2005, Vol. 894 Issue 1, p1-6, 6p |
| Databáze: | Complementary Index |
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