Issues and Challenges of Chemical Mechanical Polishing for Nano-scale Memory Manufacturing.
| Autor: | Ryu, Choon Kun, Shin, Jonghan, Park, Hyungsoon, Kwak, Nohjung, Hong, Kwon, Park, Sung Ki |
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| Zdroj: | MRS Online Proceedings Library; 2009, Vol. 1157 Issue 1, p1-8, 8p |
| Databáze: | Complementary Index |
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