Low Temperature Synthesis of Nanocrystalline Silicon and Silicon Oxide Films by Plasma Chemical Vapor Deposition.

Autor:	Tomyo, Atsushi, Kaki, Hirokazu, Takahashi, Eiji, Hayashi, Tsukasa, Ogata, Kiyoshi, Uraoka, Yukiharu
Zdroj:	MRS Online Proceedings Library; 2008, Vol. 1066 Issue 1, p1-6, 6p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu Full text from SpringerLink