Boron Incorporation and Its Effect on Electronic Properties of Ge:H Films Deposited by LF Plasma.

Autor:	Kosarev, Andrey, Alfonso, J. Torres, Nery, D. Checa, Kudriavtsev, Yurii, Asomoza, Rene, Salvador, G. Hernandez
Zdroj:	MRS Online Proceedings Library; 2008, Vol. 1066 Issue 1, p1-6, 6p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu Full text from SpringerLink