Boron Enhanced H Diffusion in Amorphous Si Formed by Ion Implantation.
| Autor: | Johnson, Brett C., Atanacio, Armand J., Prince, Kathryn E., McCallum, Jeffrey C. |
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| Zdroj: | MRS Online Proceedings Library; 2008, Vol. 1070 Issue 1, p1-6, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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