Theoretical and Experimental Investigation of Thermal Stability of HfO2/Si and HfO2/SiO2 Interfaces.

Autor: Liu, Chun-Li, Stoker, Matt, Hegde, Rama I., Rai, Raghaw S., Tobin, Philip J.
Zdroj: MRS Online Proceedings Library; 2002, Vol. 731 Issue 1, p1-4, 4p
Databáze: Complementary Index