Theoretical and Experimental Investigation of Thermal Stability of HfO2/Si and HfO2/SiO2 Interfaces.
Autor: | Liu, Chun-Li, Stoker, Matt, Hegde, Rama I., Rai, Raghaw S., Tobin, Philip J. |
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Zdroj: | MRS Online Proceedings Library; 2002, Vol. 731 Issue 1, p1-4, 4p |
Databáze: | Complementary Index |
Externí odkaz: |