Degradation and SILC Effects of RPECVD sub-2.0nm Oxide/Nitride and Oxynitride Dielectrics Under Constant Current Stress.
| Autor: | Lee, Yi-Mu, Wu, Yider, Hong, Joon Goo, Lucovsky, Gerald |
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| Zdroj: | MRS Online Proceedings Library; 2002, Vol. 716 Issue 1, p1-6, 6p |
| Databáze: | Complementary Index |
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