Reducing density-induced CMP non-uniformity for advanced semiconductor technology nodes.

Autor:	Zhang, John H., Tseng, Wei-Tsu, Chen, Tien, Kim, Ben, Flaitz, Philip, Kleemier, Walter, Goldberg, Cindy, Truong, Connie, Grunow, Stephan
Zdroj:	MRS Online Proceedings Library; 2013, Vol. 1560 Issue 1, p1-6, 6p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu Full text from SpringerLink