Engineered Low Resistivity Titanium-Tantalum Nitride Films by Atomic Layer Deposition.

Autor: Londergan, Ana R., Winkler, Jereld L., Vu, Kim, Matthysse, Lawrence, Seidel, Thomas E., Sneh, Ofer
Zdroj: MRS Online Proceedings Library; 2001, Vol. 714 Issue 1, p1-6, 6p
Databáze: Complementary Index