Reductive photopatterning of phenylene-vinylene-based polymers.

Autor: Kavc, T., Langer, G., Kern, W., Ruplitsch, A., Mahler, K., Stelzer, F., Hayn, G., Saf, R., List, E. J. W., Zojer, E., Ahmed, M. T., Pogantsch, A., Iskra, K. F., Neger, T., Hörhold, H. H., Tillmann, H., Kranzelbinder, G., Toussaere, E., Jakopic, G.
Zdroj: MRS Online Proceedings Library; 2001, Vol. 708 Issue 1, p1-6, 6p
Databáze: Complementary Index