Low Temperature Silicon Dioxide Deposition and Characterization.
Autor: | Chatham, Hood, Mogaard, Martin, Okuyama, Yoshi, Treichel, Helmuth |
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Zdroj: | MRS Online Proceedings Library; 2006, Vol. 913 Issue 1, p1-6, 6p |
Databáze: | Complementary Index |
Externí odkaz: |