Correlation of Phase Segregation and Electrical Properties of Low-Power MOSFETs with Hf-based Silicate Gate Dielectric Layers and TaN Metal Gates.

Autor: Petry, Jasmine, Rittersma, Chris, Vellianitis, Georgios, Cosnier, Vincent, Conard, Thierry, Deweerd, Wim, Van Berkum, Jan G. M.
Zdroj: MRS Online Proceedings Library; 2006, Vol. 917 Issue 1, p1-6, 6p
Databáze: Complementary Index
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