Oxide-Semiconductor Interface Characterization Using Kelvin Probe-AFM In Combination With Corona-Charge Deposition.

Autor: Lägel, Bert, Ayala, Maria D., Oborina, Elena, Schlaf, Rudy
Zdroj: MRS Online Proceedings Library; 2003, Vol. 786 Issue 1, p1-6, 6p
Databáze: Complementary Index