Oxide-Semiconductor Interface Characterization Using Kelvin Probe-AFM In Combination With Corona-Charge Deposition.
Autor: | Lägel, Bert, Ayala, Maria D., Oborina, Elena, Schlaf, Rudy |
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Zdroj: | MRS Online Proceedings Library; 2003, Vol. 786 Issue 1, p1-6, 6p |
Databáze: | Complementary Index |
Externí odkaz: |