Low-temperature growth of HfO2 dielectric layers by Plasma-Enhanced CVD.

Autor:	Losurdo, M., Giangregorio, M. M., Luchena, M., Capezzuto, P., Bruno, G., Barreca, D., Gasparotto, A., Tondello, E.
Zdroj:	MRS Online Proceedings Library; 2003, Vol. 786 Issue 1, p1-6, 6p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu Full text from SpringerLink