A New Pathway for Si Nanocrystal Formation: Oxi-Reduction Induced by Impurity Implantation.

Autor:	Jacobsohn, L. G., Zanatta, A. R., Lee, J. K., Cooke, D. W., Bennett, B. L., Wetteland, C. J., Tesmer, J. R., Nastasi, M.
Zdroj:	MRS Online Proceedings Library; 2003, Vol. 777 Issue 1, p1-6, 6p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu Full text from SpringerLink