Hot Wall Isothermal RTP for Gate Oxide Growth and Nitridation.
Autor: | Laser, Allan, Ratliff, Christopher, Yao, Jack, Bailey, Jeff, Passefort, Jean-Claude, Vaughan, Eric, Page, Larry |
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Zdroj: | MRS Online Proceedings Library; 2000, Vol. 611 Issue 1, p1-6, 6p |
Databáze: | Complementary Index |
Externí odkaz: |