Hot Wall Isothermal RTP for Gate Oxide Growth and Nitridation.

Autor: Laser, Allan, Ratliff, Christopher, Yao, Jack, Bailey, Jeff, Passefort, Jean-Claude, Vaughan, Eric, Page, Larry
Zdroj: MRS Online Proceedings Library; 2000, Vol. 611 Issue 1, p1-6, 6p
Databáze: Complementary Index